1200℃ high vacuum CVD equipment with MFC for 2D nano material

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam
react on the surface of a substrate to synthesize coatings or nanomaterials. It is
the most widely used technology in the semiconductor industry to deposit a variety
of materials, including a wide range of insulating materials, Most metal materials
and metal alloy materials.
CY-O1200-50IT-3Z-HV 1200℃ single heating zone high vacuum CVD system consists of a
single heating zone tube furnace, a three-channel float flow meter and a high
vacuum molecular pump set. It is suitable for high-temperature sintering, metal
annealing, quality inspection, etc. in universities, research institutes,
industrial and mining enterprises, especially for CVD experiments that require a
variety of gas mixing atmospheres.

Vacuum tube furnace Model CY-O1200-50IT
Tube material High purity quartz
Tube diameter 50mm (Optional 60mm/80mm/100mm)
Tube length 800mm
Furnace chamber length 440mm
Heating zone length 400mm
Constant temperature   zone 200mm
Operating temperature 0～1100℃
Temperature control accuracy ±1℃
Temperature control mode 30 or 50 segment program temperature
control
Display mode LCD
Sealing method 304 stainless steel vacuum flange
Flange interface 1/4" ferrule connector, KF16/25/40 joint
Vacuum 4.4E-3Pa
Power supply AC:220V 50/60Hz
Gas supply system Model CY-3Z
Gas channel 3-channel
Measuring unit Gas mass flowmeter
Measuring range A channel: 0～100 SCCM H2 gas Remarks: If you need  
other ranges or gas types, you need to specify when ordering. According to the
customer's specific requirements, the flow meter of the corresponding gas   type
and range can be selected.
B channel: 0～300SCCM N2 gas
C channel: 0～500SCCM  Ar   gas
measurement accuracy ±1.0%F.S
Pipe pressure   resistance 3MPa
Working pressure  difference 50～300KPa
Connecting pipe 304 stainless steel
Gas channel 304 stainless steel needle valve
Interface specification 1/4" ferrule connector for gas inlet and outlet
Exhaust system Model CY-GZK103-A
Molecular pump CY-600
Backing pump Rotary vane pump
Pumping rate Molecular pump: 600L/S Comprehensive gas pumping
performance: the vacuum can reach 1.0E-3Pa in 30 minutes.
Rotary vane pump: 1.1L/S
Pumping interface KF40
Exhaust interface KF16
Vacuum measurement Compound vacuum gauge: Resistance gauge +
ionization gauge
Ultimate vacuum 1.0E-5Pa
Power supply AC:220V 50/60Hz

Minimum Order: 1 sets

Click to Enlarge