1200℃ high vacuum CVD reactor with 3-channel float flowmeter

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam
react on the surface of a substrate to synthesize coatings or nanomaterials. It is
the most widely used technology in the semiconductor industry to deposit a variety
of materials, including a wide range of insulating materials, Most metal materials
and metal alloy materials.
CY-O1200-50IT-3F-HV 1200℃ single heating zone high vacuum CVD reactor consists of
a single heating zone tube furnace, a three-channel float flow meter and a high
vacuum molecular pump set.
This reactor is also equipped with a precision molecular pump set, which can
achieve a vacuum of 1.0E-3pa level, which can provide users with a purer and more
stringent experimental environment than ordinary mechanical pumps.

Vacuum tube   furnace Model CY-O1200-50IT
Tube material High purity quartz
Tube diameter 50mm (Optional 60mm/80mm/100mm)
Tube length 800mm
Furnace chamber   length 440mm
Heating zone   length 400mm
Constant   temperature zone 200mm
Operating   temperature 0～1100℃
Temperature   control accuracy ±1℃
Temperature   control mode 30 or 50 segment program temperature
control
Display mode LCD
Sealing   method 304 stainless steel vacuum flange
Flange   interface 1/4" ferrule connector, KF16/25/40 joint
Vacuum 4.4E-3Pa
Power supply AC:220V   50/60Hz
Gas supply system Model CY-3F
Gas channel 3-channel
Measuring   unit Gas float flowmeter
Measuring range A channel: 0～100ml/min  H2 gas Remarks: If   you
need other ranges or gas types, you need to specify when ordering.   According to
the customer's specific requirements, the flow meter of the corresponding gas type
and range can be selected.
B channel: 16～160 ml/min  N2 gas
C channel: 25～250 ml/min  Ar gas
Measurement   accuracy ±2.0%
Pipe   pressure resistance 3MPa
Working   pressure difference 50～300KPa
Connecting   pipe 304 stainless steel
Control   valve 304 stainless steel needle valve
Interface   specification 1/4" ferrule connector for gas inlet and
outlet
Exhaust   system Model CY-GZK103-A
Molecular   pump CY-600
Backing pump Rotary vane pump
Pumping rate Molecular pump: 600L/S Comprehensive gas pumping
performance: the vacuum can reach 1.0E-3Pa in 30 minutes.
Rotary vane pump: 1.1L/S
Pumping   interface KF40
Exhaust   interface KF16
Vacuum   measurement Compound vacuum gauge: Resistance gauge +
ionization gauge
Ultimate   vacuum 1.0E-5Pa
Power supply AC:220V   50/60Hz

Minimum Order: 1 sets

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