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Contact: Adela
Company: Shanghai GaNova Electronic Information Co., Ltd.
Building 11, Lane 1333, Jiangnan Avenue, Changxing Town, Chongming District, Shanghai
shanghai 200000
China
Phone: 86-159-62257010
Fax: 86-159-62257010
E-Mail: Send Inquiry 1st year
Date/Time:  6/12/23 9:40 GMT
 

2inch GaN Epitaxial Wafer C Face Fe Doped SI Type Free Standing

2inch C-face Fe-doped SI-type free-standing GaN single crystal substrate Resistivity >
106 Ω·cm RF devices



The growth characteristics of Fe-doped GaN epitaxial layers on semi-insulating SiC (001)
substrates were studied using metalorganic chemical vapor deposition for high
breakdown voltage device applications. A smooth Fe-doped GaN epilayer surface can be
realized by changing the ferrocene flow, while higher Fe concentrations in the GaN
epilayer affect the surface morphology.
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