DC RF magnetron bias sputtering coating machine with 2-target

Double target magnetron sputtering coater is a small laboratory coater with two
targets developed by our company. It can be used to prepare single or multi-layer
ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film,
dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages
of high energy, high speed, high coating rate and low sample temperature rise,
which is a typical high-speed low-temperature sputtering. The magnetron target is
equipped with a water-cooled inter layer, the water cooler can effectively take
away heat, avoid heat gathering on the target surface, and make the magnetron
coating work stably for a long time.

In addition, the device is also equipped with bias power supply, which can add bias
electric field between the target and the sample platform, enhance the energy of
ions, improve the film quality and adhesion of the film. The whole machine adopts
touch screen control, one key coating procedure, simple operation, and is an ideal
equipment for preparing thin film in the laboratory.. 

Technical Parameters
Voltage AC220V，50Hz,Power3KW
Sample carrier 
Sizeφ140mm,Heating temp：MAX.500℃,Accuracy：±1℃,Speed：1~20rp , m adjustable
Magnetron sputtering head 
Number: two,2-inch,Cooling mode:Water cooling,10L / min flow rate
Vacuum Chamber 
Size：φ300mm × 300mm H,Material：stainless steel,Observation window：φ100mm
Opening mode：Open top, easy to replace the target
Gas flow controller 2 ways: Ar, N2;Range 0-100sccm
Ultimate vacuum 10-6 torr
Vacuum pump:Molecular pump system, pumping speed: 600L/S
Film thickness gauge
Quartz vibrating film thickness gauge , resolution: 0.10 μ M
Sputtering power supply 
One DC power supply, 1000W, suitable for preparing metal film
One RF power supply, 500W, suitable for non-metallic coating
Operation mode Panel button operation
Dimensions 1400mm × 750mm × 1300mm
Weight 300 KG

Minimum Order: 1 sets

Click to Enlarge