desktop double target DC magnetron sputter coating machine

desktop double target DC magnetron sputter coating machine
This equipment is a double target magnetron sputter coating machine, which can be
used in the preparation of metal films, in the fields of electronics, optics,
special ceramics, etc. it can also be used to prepare SEM samples in laboratory.
It adopts high vacuum stainless steel chamber, front door opening design, and
quartz observation window on the door, which is convenient for the observation and
recording of the experiment. At the same time, the equipment is equipped with a
rotary heating sample table, which can effectively improve the film uniformity and
film quality. A set of baffle plate is installed on the top cover, and the two
targets can be switched by rotating the baffle plate to realize multilayer coating.
This equipment needs to be used together with high vacuum molecular pump group.
Users can choose imported brand small molecular pump to further save installation
area.
At the same time, the model can be equipped with film thickness meter components,
which can monitor the film thickness in real time and provide reliable parameters
for the experimental process.

Technical parameter
1. Sample stage
Size 100mm Heating ≤500℃
Rotation speed 1-20r/min Temp control ±1℃
2. Magnetron sputter head
Quantity 2” x2 Cooling mode Water cooled
3. Vacuum chamber Size Dia 210mm× 260mm Watch window φ40mm
Material SUS Open mode Front opening
4. Sputter power supply DC power supply 1 set Output power ≤300W
Output voltage ≤600V response time ＜5ms
5. Water cooling Tank capacity 9L Flow 10 L/min
6. Film thickness gauge Accuracy 0.1angstrom Cooling mode
Water cooling
7.Molecular pump system Backing pump Rotary vane pump Pumping
1.1L/s
Secondary pump turbo molecular pump（domestic） Pumping 600L/s
Extraction interface KF40 Air outlet KF16
8.Other Power supply AC220V,50Hz Total power 4kw

Minimum Order: 1 sets

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