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Contact: iris zhang
Company: Zhengzhou CY Scientific Instrument Co., Ltd.
No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
Zhengzhou 450000
China
Phone: +8637155199322
E-Mail: Send Inquiry Member for over 2 years
Date/Time:  1/25/21 9:06 GMT
 

lab 3-target dc magnetron co-sputtering coating machine

three target dc magnetron sputtering coating equipment
Magnetron sputtering coating equipment is a special laboratory coating instrument
developed by our company. The equipment can be equipped with DC power supply and RF
power supply. The power ranges from 500W to 1000W. It can be used to prepare single
or multilayer ferroelectric thin films, conductive films, alloy films,
semiconductor films, ceramic films, dielectric films, optical films, etc.
Compared with the conventional plasma sputtering, magnetron sputtering has the
advantages of high energy, high speed, high deposition rate and low sample
temperature rise. The magnetron target is equipped with water-cooled interlayer.
The water cooler can effectively take away heat and avoid heat accumulation on the
target surface, so that the magnetron coating can work stably for a long time.
After compact design, the balance of volume and performance is realized, the
appearance is beautiful and the function is comprehensive. The whole machine is
controlled by touch screen and built-in one button coating program, which is easy
to operate and is an ideal equipment for preparing thin films in laboratory.

Technical parameter
1. Power supply AC220V,50Hz
2. Whole power 6KW
3. Limit Vacuum Degree 5x10-4Pa
4. Sample table parameters
Size φ150mm
Heat temp 500℃ max.
Temp control ±1℃
Rotation speed 1-20rpm adjustable
4. Magnetron sputtering head parameters
Quantity:3 Size:2”
Cooling mode Water cooled,flow 10L/min required
Water chiller 10L/min Circulating water cooling
5. Vacuum chamber
Size φ300mm X 340mm H
Material SUS
Watch window φ100mm
Opening mode open type, easy to replace target
6. Gas flow controller One-channel,200sccm Ar;
7. Vacuum pump:A molecular pump system,pumping 600L/S
8.Quartz vibrating film thickness gauge
One set, resolution 0.10 angstrom
9. Sputter power source
DC power supply:500W-1000W,Suitable for preparing metal films
10. Operating mode:All-in-one computer operation
11. Overall Dimensions 1090mm X 900mm X 1250mm
12. Total weight 350kg

Minimum Order: 1 sets

lab 3-target dc magnetron co-sputtering coating machine
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