MPCVD single crystal diamond deposition equipment

MPCVD single crystal diamond deposition equipment

Application
Preparation of high-quality single crystal diamond;
Preparation of high-quality polycrystalline free-standing diamond films;
Preparation of high quality polycrystalline diamond films;
Preparation of various carbon nano films such as graphene, carbon nanotubes,
fullerenes and diamond films.

Features
a.Stainless steel cavity type 6kw microwave plasma equipment, high power density;
b.The water-cooled substrate stage and the water-cooled metal chamber ensure the
system can work stably for a long time;
c.The substrate temperature is achieved by microwave plasma self-heating;
d.The vacuum measuring instrument adopts a full-range vacuum gauge, which can
accurately measure the background vacuum and working gas pressure;
e.The vacuum pump and valve adopt turbo molecular pump (the ultimate vacuum is
1×10-5Pa) and the rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa),
and the system can automatically control the deposition pressure;
f.Cooling water circulation system to ensure long-term safe and stable operation of
the device under high power;
g.15-inch touch screen, PLC automatic control, can set the temperature or pressure
to be constant, can save and reuse up to 20 sets of process files;
Fully automatic process control module, which can stably and reliably prepare high-
quality diamond films and crystals

Minimum Order: 1 sets

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