PTFE Wafer Basket for Cleaning and Etching Processes, Non-Wetting Surface

1.Made of high-purity PTFE, offering excellent resistance to acids, alkalis,
and extreme temperatures (-200 to 250 °C).
2.Low background levels with minimal metal contamination, ensuring
contamination-free performance.
3.Smooth, non-wetting surface that prevents adhesion and allows easy
cleaning.
4.Soft yet wear-resistant material effectively protects wafer surfaces while
securely holding wafers in place.
5.Compatible with Y- or M-shaped handles for convenient and safe operation.

Applications
--Cleaning processes:Removal of particles, organic residues, and metal
contaminants from wafer surfaces.
--Etching processes:Precise removal of specific material layers using
chemical solutions.
--Photoresist stripping:Removal of residual photoresist after lithography.
--Wet processing:Transfer and temporary storage before and after diffusion or
thin-film processes.

Minimum Order: 1 pieces

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