two target DC plasma sputtering coating machine with rotary sample stable

This type of small plasma sputtering coating machine adopts two-stage sputtering
method, which is widely used for SEM sample preparation or metal coating
experiment. Using low-temperature plasma sputtering process, there is no high
temperature during the coating process, and it is not easy to produce thermal
damage. This small plasma sputtering coater uses PLC control system, all touch
screen operation, easy to learn and use. This model machine is also equipped with a
rotatable sample stage, which can effectively improve the uniformity of the
coating.

Technical parameter
Sample stage size 100mm
Distance from sample stage to target surface 20~35mm height adjustable
Rotating speed 1~20rpm adjustable
Plasma sputtering source Quantity 2 inchesx2 Naturalcooling
Vacuum chamber Chamber size φ180mm x 210mm
Observation window Omnidirectional visibility
Chamber material High purity quartz
Open method Top cover removable
Upper and lower cover material 304 stainless steel
Pumping port KF16
Intake port 1/4 inch ferrule connector
DC power supplyx1 Output power Max. 150W
Sputtering power 1200V
Max. sputtering current 50mA
Vacuum pump type Dual-stage rotary vane vacuum pump
Pumping port KF16
Exhaust interface KF16
Pumping rate 1.1L/s（4m3/h）
Ultimate vacuum ≥0.1Pa
Vacuum measurement Resistance vacuum gauge
Power supply AC 220V 50Hz
Total power 1.5kW/2kW
Dimension 500mm x 320mm x470mm
Weight 30kg

Minimum Order: 1 sets

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