Ultra Clean PTFE Single Wafer Holder for Wafer Cleaning and Developing

1.Made of high-purity PTFE, offering excellent resistance to acids, alkalis,
and extreme temperatures (-200 to 250 °C).
2.Low background levels with minimal metal contamination, ensuring
contamination-free performance.
3.Smooth, non-wetting surface that prevents adhesion and allows easy
cleaning.
4.Soft yet wear-resistant material effectively protects wafer surfaces while
securely holding wafers in place.
5.Mesh or perforated structure ensures uniform flow and contact of developer
solution across wafer surfaces.
6.Standard sizes include 4", 6", 8", and 12"; customization available.

Applications
--Photolithograp , hy:Used during the developing step to ensure precise transfer
of photoresist patterns.
--Cleaning processes:Resistant to a wide range of cleaning chemicals used in
wafer cleaning.
--Etching processes:Suitable for both dry and wet etching, protecting wafers
from mechanical and chemical damage.

Minimum Order: 1 pieces

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