5000rpm spin coater with vacuum chuck for 12-inch wafer

Introduction
CY-SPC12-C spin coater is with vacuum chuck designed for easy and quick coating via
sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision
motor, the maximum speed can reach 5000rpm, which effectively guarantees the
uniformity of film formation. Besides, the instrument adopts touch screen control,
can preset the coating curve, which greatly simplifies the process.

Application
Liquid or colloidal materials can be coated on silicon wafers, crystals, quartz,
ceramics and other substrates to form thin films, mainly used in photoresist spin
coating, biological medium production, sol-gel method for polymer film production,
etc.

Technical parameters
1. Input power supply AC220V, 50Hz
2. Chamber material PP (transparent acrylic)
3. Substrate size Diameter≤12 inches (~300mm)
4. Spin speed 0-5000rpm
5. Acceleration 100-5000rpm/s
6. Speed resolution 1rpm
7. Single step time 3000s
8. Operation method 7 inches HD LCD touch screen
9. Dispensing method Manual dispensing
10. Coating curve Each curve has 5 segments, can store 5 curves in total
11. Vacuum chuck Yes, includes
12. Vacuum pump Oil-less pump
13. Pumping speed 50 L/min
14. Total weight ~40kg

Minimum Order: 1 sets

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