customization DC RF magnetron co-sputtering coater with 3-target

Magnetron sputtering is a kind of Physical Vapor Deposition (PVD).General
sputtering method can be used to prepare metal, semiconductor, insulator and other
materials, and has the advantages of simple equipment, easy control, large coating
area and strong adhesion.Compared with similar equipment, this three-target
magnetron sputtering coater is not only widely used, but also has the advantages of
small size and easy operation, and is an ideal equipment for preparing material
films in a laboratory.

Three targets magnetron sputtering coater (500W DC&500W RF) can be used for
preparing single-layer or multi-layer ferroelectric thin films, conductive films,
alloy films, semiconductor films, ceramic films, dielectric films, optical films,
oxide films, hard films, PTFE films, and the like.

Minimum Order: 1 sets

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