RF magnetron sputtering pvd coater with 2 target for R&D

RF magnetron sputtering coating with 2 target can be used for preparing
single or multi-layer ceramic films, dielectric films, optical films, oxide
films, hard films, PTFE films, and the like. Compared with similar equipment,
the dual-target magnetron sputtering coating machine is not only widely used,
but also has the advantages of small size and easy operation, and is an ideal
equipment for preparing a material film in a laboratory.

Technical parameter
Sample stage Size:φ185mm
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering   target head Quantity:2”×2 (1”,2” optional)
Water chiller:Circulating water chiller   with flow rate of 10L/min
Vacuum chamber Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter 2 channels; measuring range 100SCCM; 100SCCM (can be
customized according to customer needs)
Vacuum system Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:C;220V 50/60Hz
Pumping rate:Molecular pump:   600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes
Power configuration RF power supply×2;Max output power:RF 300 W
Other parameters Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:2.5KW
Total Weight:About 300kg

Minimum Order: 1 sets

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