lab-scale DC magnetron sputtering coating machine with 2-target

Dual-target DC magnetron sputtering coater CY-MSP300S-2DC is a cost-effective
magnetron sputtering coating equipment independently developed by our company. It
is standardized, modular and customizable.

There are 1-inch or 2-inch magnetron targets for you to choose. Customers can
choose the target according to the size of the substrate to be coated. The device
is equipped with two 500W DC power supply. The DC power supply can be used for the
preparation of metal film. The two targets can meet the needs of multi-layer or
multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If
you have other requirements, you can customize the gas path of up to four-channel
mass flowmeters to meet the complex gas environment construction requirements. The
instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum
is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.
Molecular pump gas path is controlled by multiple solenoid valves, you can open the
chamber to take out the sample without shutting down the pump, greatly improving
your work efficiency.
This product can be equipped with an integrated industrial computer to control the
system. In the computer program, most functions such as vacuum pump control and
sputtering power control can be realized, which can further improve your
experimental efficiency.

Application:
This device can be used for preparing single-layer or multi-layer ferroelectric
thin films, conductive films, alloy films, and the like. Compared with similar
equipment, the dual-target magnetron sputtering coater is not only widely used, but
also has the advantages of small size and easy operation, and is an ideal equipment
for preparing material films in a laboratory.

Minimum Order: 1 sets

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