Thermal Vacuum Cleaning System

TESTEQ Thermal Vacuum Cleaning System for High-Precision Semiconductor
Components

Industry-Leading Contamination Removal for Lithography, Optics & Wafer
Processing

This equipment adopts an innovative inclined sealing structure (patented
design-Thermal Vacuum/Lithography/UHV). 

Through the gravity-adaptive cover plate and double-ring sealing ring
interlocking technology, it can maintain a stable vacuum level (≤10⁻⁶ Pa),
solving the problem of reduced cleaning efficiency caused by sealing failure in
traditional equipment. 

It integrates a dual-fluid spray system (sodium hydroxide + deionized water),
supporting non-destructive cleaning in a high-temperature (350℃) vacuum
environment, avoiding thermal stress deformation.

 It is suitable for the maintenance of high-precision components such as mask
plates, lens groups, and vacuum pump components of lithography machines,
significantly improving chip yield and equipment lifespan.If you need more
models about our test equipment, please reference our ： chamber-testing
（Click）com

Minimum Order: 1 sets

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