three target magnetron sputtering coating machine with UPS

three target magnetron sputtering coater with UPS can be used for preparing single-
layer or multi-layer ferroelectric thin films, conductive films, alloy films,
semiconductor films, ceramic films, dielectric films, optical films, oxide films,
hard films, PTFE films, and the like. Compared with similar vacuum PVD equipment,
this three-target magnetron sputtering coater is not only widely used, but also has
the advantages of small size and easy operation, and is an ideal equipment for
preparing material films in a laboratory.


Technical Parameters
***Supply Voltage:VAC 220, 60Hz
UPS:20KVA 16KW, 1 hour delay,16 batteries, with capacity of 38AH
***Vacuum Chamber 
Dimension: Dia. 325 mm * H 385 mm
Material: 304 stainless steel
Viewport (Window): ~4'' (100mm) with shutter
***Sample Stage 
Top sample holder
Sample table: Dia. 150mm
Sample size: Max. 4'' diameter
Rotary speed: 0-40rpm adjustable
Heating temperature: up to 700oC
***Magnetron Sputtering Gun 
3× 2'' magnetron sputter guns, with automatic shutter
Sputtering orientation upwards
Target diameter: 2''
Magnets: rare earth magnet
***Mass Flow Meter 
3 × MFC mass flow control (Ar, O2 and N2)
Measuring ranges: up to 20sccm
With pneumatic isolation valve(s) and filter.
***Full Automatic control by PC or PLC, to control 
Store for minimum 100 recipe,19'' Flat controller

Minimum Order: 1 sets

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