Chemical Equipment & Lab Supplies

This high-voltage electrospinning machine is for preparing ultra-fine fibers with the diameter of 20-1000nm by using a polymer solution or molten liquid in a strong electric field. The nanofiber has a high specific surface area, small diameter, and large porosity. There are more than 100 kinds of polymers could be used as raw materials, and also protein, collagen, organics (PEO, DNA, PAA, PLA, nylon, polyester, acryl resin, PVA, PS, PAN, peptide, cellulose). Main parts: liquid supply device, high voltage power supply, spinning nozzle, collecting device 1.Liquid supply device: uses two professional scientific research syringe pumps, can provide liquid with continuously stable flow, and the liquid supply speed is adjustable to meet the needs of different spinning solutions. 2.High voltage power supply: can provide a stable electric field for a long time, electric field strength standard 0~30KV. 3.Spinning nozzle: Coaxial nozzle, which is composed of two inner and outer layers of two needles with different diameters. It can be used to make hollow-structured nanofibers, shell-core structured nanofibers, micron fibers, etc. Using coaxial spray technology, polymers with different properties can be combined to make nanofibers with special properties. In addition, some polymers with poor spinning performance can also be prepared into special nanofibers by coaxial spray technology. In this case, the polymer with poor spinnability should be used in the outer layer of the coaxial nozzle, and the polymer with good spinning performance as the inner structure. Besides, the support of spinning nozzle is adjustable for obtaining the best spinning distance and non-woven fabrics with different widths, which can perform automatic reciprocating motion parallel to the collector, effectively improve the uniformity. 4.Collecting device: standard configuration is one drum collector. Other plate collectors are optional.

Minimum Order: 1 bags

The high-voltage electrospinning machine produced by our company is a device for preparing ultra-fine fibers based on electrospinning technology by using polymer solution or melt to spray in a strong electric field. It is mainly composed of four parts: liquid supply device, spinning head, high voltage power supply and collecting device. Technical parameter Supply voltage AC220V，50Hz Total power 2.5KW Input voltage 0-30kV Max current 0.5mA Heating method Infrared heating tube Max temperature Substrate temperatures up to 60℃ Max heating power 1000W Syringe capacity 2.5ml~60ml Flow range 2.779μl/min~72.24ml/min Mandrel collector:6 sets with various size: 200mm x φ100, 25, 12, 7, 6.0, 2.0mm; Actuator: brushless motor; mandrel shaft speed: 300-4000 rpm; Plate collector Dimensions: 320mm x 100mm x 2mm; Material: Stainless steel Y-axis movable plate collector Dimensions: 300mm x 200mm x 5mm; Material: Stainless steel; used to prepare film, computer program to control the way of moving

Minimum Order: 1 bags

The high-voltage electrospinning machine produced by our company is a device for preparing ultra-fine fibers based on electrospinning technology by using polymer solution or melt to spray in a strong electric field. The machine is mainly composed of four parts: liquid supply device, spinning head, high voltage power supply and collecting device. The liquid supply device adopts a professional scientific research syringe pump, which can provide continuous and stable flow of liquid, and the liquid supply speed can be adjusted to meet the needs of different types of spinning solutions. The spinning head has multiple nozzles and the number of nozzles is optional. The bracket can be adjusted to obtain the best spinning distance and non-woven fabric with different width. The high-voltage power supply can provide long-term stable electric field and the electric field strength for electrospinning is 0-30kV. Equipped with three sets of collecting devices, including a set of six sizes of mandrel collectors for electrospinning; a plate collector for nanofiber collection; and a set of XY-axis movable plate collectors for the preparation of film.

Minimum Order: 1 bags

The spray pyrolysis film preparation method is to atomize the solution and spray it onto a heated substrate, and then obtain a desired material structure on the substrate. This equipment is an ultrasonic spray pyrolysis equipment independently developed by our company. It is equipped with 40KHz 130W ultrasonic sprayer, PID temperature-controlled substrate heater plate, high precision peristaltic pump and precision programmable stepping motor moving mechanism. The integrated design of the device can accurately control the parameters such as the amount of solution, the speed of the spray particles and the size of the spray particles, and the substrate temperature can also be controlled to meet your various experimental needs. Technical parameter Supply voltage AC220V, 50Hz Max power 3.5KW (including compressor + peristaltic pump 1.5KW) Ultrasonic sprayer 40KHz 130W Liquid viscosity 1-50mPa·s (cP) Nozzle stroke X-Y axis up to 190mm Moving speed 10-180mm/s (x-axis direction)  10-180mm/s (Y-axis direction) Substrate heater plate 150mm×150mm Max temperature 500℃ Temperature control method AI-PID temperature control dispensing tank capacity 50mL / 250mL (two containers included) Peristaltic pump dispensing rate 0.006-41mL/min Control method Industrial computer + instrument panel Overall size 850mm×850mm×1450mm

Minimum Order: 1 bags

Spray pyrolysis film formation method is to spray the solution on a heated base after atomizing the solution, and then obtain the desired material structure on the substrate. This material preparation method is particularly suitable for depositing oxides, and has a long history in the application of preparing transparent electrodes. This method is now widely used in the preparation of perovskite solar cells. This equipment adds a multi-nozzle coordination system and a vacuum system on the basis of ordinary pyrolysis spraying. It is equipped with three high-pressure gas- driven atomizing nozzles and matching anti-dripping baffles. It can work together through the touch screen to make Multi-layer film. The vacuum system can provide a basic vacuum of 5000Pa, and can be sprayed and pyrolyzed under a protective gas environment after being filled with an inert gas. In addition, the instrument also has a high-precision peristaltic pump and a precision-programmed stepping motor moving mechanism. At the same time, the substrate temperature can also be controlled to meet your various test needs.

Minimum Order: 1 bags

The spray pyrolysis film preparation method is to atomize the solution and spray it onto a heated substrate, and then obtain a desired material structure on the substrate. This equipment is an ultrasonic spray pyrolysis equipment independently developed by our company. It is equipped with 40KHz 130W ultrasonic sprayer, PID temperature-controlled substrate heater plate, high precision peristaltic pump and precision programmable stepping motor moving mechanism. The integrated design of the device can accurately control the parameters such as the amount of solution, the speed of the spray particles and the size of the spray particles, and the substrate temperature can also be controlled to meet your various experimental needs. This material preparation method is particularly suitable for the deposition of oxides and has a long history of application in the preparation of transparent electrodes. This method is now widely used in the preparation of perovskite solar cells.

Minimum Order: 1 bags

CY-PECVD-450 chemical vapor deposition adopts plasma enhanced chemical vapor deposition technology, which can use high-energy plasma to promote the reaction process, effectively increase the reaction speed and reduce the reaction temperature. It is suitable for depositing thin films of silicon nitride, amorphous silicon and microcrystalline silicon on different substrates such as optical glass, silicon, quartz and stainless steel. It has good film-forming quality, less pinholes and is not easy to crack. It is suitable for the preparation of amorphous silicon and microcrystalline silicon thin film solar cell devices. It can be widely used in the scientific research and small batch preparation of thin film materials in Colleges and universities and scientific research institutes. Technical parameter Type CY-PECVD-450 Vacuum chamber front opening door，φ300mm X 300mm，stainless steel viewing window：φ100mm with baffle Vacuum pump set Backing pump: rotary vane pump pumping speed is 1.1L/s Secondary pump: Turbo molecular pump pumping speed 600L/s Limiting vacuum 10-6Pa 10-4Pa（Within 30 minutes） Vacuum（deposition） 0.133~133Pa，adjusted according to the process RF power 13.56MHz，500W (automatch) Flow control mass flowmeter（default Ar,0~200sccm） Dimensions 1100mm x 800mm x1100mm

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Customize pulsed laser sputtering deposition system Pulsed laser deposition system, abbreviated as PLD system, this system consists of two parts: excimer laser and vacuum coating chamber; vacuum coating chamber consists of a sputtering vacuum chamber, a rotating target stage, an anti-oxidation substrate heating stage, a working gas path, gas extraction system, installation machine table, vacuum measurement and electrical control system. 1.Sputtering vacuum chamber size spherical /Ф450mm. Material high-quality stainless steel It is welded by argon arc. The surface is polished by a special process. The interface is sealed with a metal gasket or a fluorine rubber ring 2.Rotating target platform target size(i) Φ60mm and (ii) Φ25mm rotation speed Four targets can be loaded at a time 5~60 rpm, continuously adjustable, target position revolution controlled by the motor-driven magnetic coupling mechanism target material shield The target material shield shields 4 targets, and only one target material is sputtered into the film at a time, so as to avoid cross contamination between the target materials 3.Antioxidant substrate heating table substrate size φ2 ″ substrate can be placed; heating temperature The maximum temperature is 800℃±1℃, controlled by thermocouple closed-loop feedback, and the heater is made of antioxidant material. mode of motion The substrate can rotate continuously, the speed is 5~60 rpm, controlled by the motor-driven magnetic coupling mechanism distance The distance between the substrate and the target platform is adjustable from 30 to 90mm and controlled by a manual bellows adjustment mechanism outside the chamber others Manual control sample baffle components: 1 set; Sample holder: 2; 4.Gas circuit system 2 channels 5.Laser beam scanning control system Two-dimensional scanning mechanical platform, two sets of motor control, or manual control; 6.Other configuration Window and flange interface parts 1 set gas pumping unit, valve, pipeline 1 set 1 set of machine mounting frame assembly :High quality square steel profile welded, quick unloading coaming surface spray treatment; Machine surface with stainless steel skin decoration; four casters can be fixed and movable Vacuum measurement and electrical control system 1 set Computer control system 1 set

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Multi-Arc Ion Plating CY-MIOP400S-2TA This equipment is multi arc ion coating equipment. Multi arc ion plating uses gas discharge or partial dissociation of evaporated materials to deposit evaporated or reactive materials on the substrate at the same time of bombardment by gas ions or particles of evaporated materials. The equipment is equipped with two multi arc targets, which are arranged on both sides of the cavity. With the planetary sample table, the coating efficiency can be effectively improved and the effect can be improved Features 1.The coating instrument also adopts the integrated design, the cavity and the electric control part are left and right separated, realizing the separation of water and electricity, and effectively ensuring the safety of users. 2.The combination of glow discharge, plasma technology and vacuum evaporation can not only improve the film quality, but also expand the application of the film. 3.It has the advantages of fast evaporation rate, strong adhesion, good diffraction and wide film material. It is very suitable for hard protective coating such as TiN. 4.At the same time, the color of the film can be changed by controlling the atmosphere, and the film is firmly combined with the substrate, so it can also be used to make decorative films of various colors.

Minimum Order: 1 bags

The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by vacuum thermal evaporation. The instrument components are highly integrated, which realize two kinds of coating functions in the same chamber. This coating machine adopts high purity quartz chamber as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-1pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.

Minimum Order: 1 bags

CY-EVS180S-HV The plasma sputtering and vacuum thermal evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation. This coating machine 304 stainless steel as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-3pa, Ultimate vacuum 1.0E- 5Pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. Applications: This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose. Scanning electron microscope sample surface gold spraying, gold steaming carbon spraying and other operations, as well as the production of non-conductor material test electrode. Technical parameters: Supply voltage AC220V，60Hz Maximum power 1200W Sample Stage Diameter φ65mm; Adjustable distance from evaporation source, adjustable range 60mm-100mm Vacuum chamber Material: 304 stainless steel O.Dφ168mm x I.Dφ160mm x 210mm Maximum temperature 1700℃ Thermocouple B type thermocouple Vacuum gauge Electronic vacuum gauge Vacuum system Foreline pump: Pufa MVP030 oil-free pump, pumping speed 30L / min Secondary pump: Leybold TURBOVAC 90iX pumping speed 90L / s Vacuum interface KF40 Intake port 1/4 card sleeve connector Overall size 500x350x400mm

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The magnetron sputtering vacuum thermal evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film.This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film. The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.

Minimum Order: 1 bags

CY-MSE310S-DCRF two-in-one coating machine can be used for coating samples of electronic products, glass, ceramic samples, metals and other samples. Especially suitable for laboratory SEM (scanning electron microscope) sample preparation. The equipment is mainly composed of quartz vacuum chamber, plasma sputtering target, evaporation coating device, sample stage for placing samples, vacuum pump unit, vacuum measuring gauge, gas intake system and control system. The main unit of the equipment adopts touch screen operation, and the temperature control meter detects. Its digital parameter interface and automatic operation mode provide users with an excellent R & D platform. The target head is at the bottom of the vacuum chamber. The sample stage has heating and rotating functions, which can make the coating effect more uniform. The equipment’s vacuum acquisition system uses the two-stage vacuum pump set. The backing pump is a large pumping speed mechanical pump, which effectively reduces the time from normal pressure to low vacuum. The main pump is a turbo molecular pump, which has a high pumping speed and a faster vacuum acquisition speed. The overall vacuum obtaining system is clean and fast. The vacuum chamber is made of 304 stainless steel and is equipped with a viewing window and a baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange adopts CF series high vacuum sealing flange. Each joint of the vacuum chamber is sealed by a rubber seal ring, which has excellent vacuum performance and can effectively guarantee the coating quality

Minimum Order: 1 bags

The equipment uses electron beam evaporation as coating equipment. It is mainly used to prepare various conductive thin films, semiconductor thin films, ferroelectric thin films, optical thin films, micro-fabrication of micro and nano devices, sample pretreatment of electron microscopy, etc. It is especially suitable for evaporating various refractory metal materials. It can be used not only on hard substrates such as glass and silicon wafers, but also on flexible substrates such as PDMS, PTFE and PI. Technical parameters of equipment Conditions of use ambient temperature 5 ~40 C Power supply three-phase 380 V Power <20 KW Water pressure <2.5bar Vacuum chamber size evaporation chamber size: Phi 500 *H500 Electronic gun a new type of electronic gun, 6-hole crucible Sample turntable Sample size: <150mm, sample can be rotated, and the distance between sample and electron gun can be adjusted up and down (Sample holder shape is designed according to user's requirements), heating temperature <500 C. System Vacuum Limit vacuum: baked for 12 to 24 hours, continuously pumped less than 5x10-5Pa Pumping Rate: Vacuum < 5x10-4Pa within 40 minutes from atmospheric start System Leakage Rate: Measuring Vacuum Vacuum Degree of Vacuum Chamber < 10Pa after 12 hours of shutdown Vacuum pumping system FB1200 molecular pump + mechanical pump (TRP-36) system with bypass pumping Coating monitoring SQM160 film thickness meter is used for monitoring. Coating thickness The unevenness of coating thickness is less than 6%

Minimum Order: 1 bags