wafer level CVD machine for molybdenum disulfide preparation

Wafer level large-size molybdenum disulfide preparation device

This equipment is a wafer level large-size molybdenum disulfide preparation device
designed based on CVD principles. It includes a three-zone tube furnace, a
specially designed furnace tube and a set of supporting gas circuits. The equipment
can uniformly release the reaction gas into the furnace tube through a specially
designed pipeline to ensure the consistency and uniformity of the product on the
back-end wafer. It is the best choice for molybdenum disulfide preparation
experiments.

Technical parameters:
1. Product model CY-O1200-120III-IC-3Z-MoS2
2. Furnace tube material High purity quartz
3. Furnace tube size External large quartz tube φ120mm x1000mm
4. Internal small quartz tube φ25mm x820mm x7
5. Temperature zone length Three heating zone 200mm+200mm+200mm
6. Temperature control accuracy ±1℃
7. Temperature curve Independent temperature control in three temperature zones,
each temperature zone can be set with 30-segment time temperature curve
8. Operating temperature 0~1150℃
9. Heating rate ≤10℃/min
10. Intake system:Three-channel mass flow meter:Ar gas 0~500sccm,N2 gas
0~200sccm,H2 gas 0~200sccm
Equipped with seven channels of gas separation, gas mixing gas path.
11. Furnace pipe flange Stainless steel water-cooled flange, equipped with KF16
vacuum interface, mechanical vacuum gauge and stainless steel needle valve
12. Power requirements AC 220V 50Hz 4kW
13. Control mode 7-inch touch screen
14. Vacuum pump Dual stage rotary vane vacuum pump
15. Vacuum Theoretical ultimate vacuum degree 10^-1Pa

Minimum Order: 1 sets

Click to Enlarge