Labs

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam react on the surface of a substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit a variety of materials, including a wide range of insulating materials, Most metal materials and metal alloy materials. CY-O1200-50IT-3Z-LV CVD tube furnace consists of a single heating zone tube furnace, a three-channel mass flow meter and a double stage rotary vane vacuum pump. It is suitable for high-temperature sintering, metal annealing, quality inspection, etc. in universities, research institutes, industrial and mining enterprises, especially for CVD experiments that require a variety of gas mixing atmospheres. Vacuum tube furnace Model CY-O1200-50IT Tube material High purity quartz Tube diameter 50mm (Optional 60mm,   80mm, 100mm) Tube length 800mm Furnace chamber length 440mm Heating zone length 400mm Constant temperature zone 200mm Operating temperature 0～1100℃ Temperature control accuracy ±1℃ Temperature control mode 30 or 50 segment program temperature control Display mode LCD Sealing method 304 stainless steel vacuum flange Flange interface 1/4" ferrule connector, KF16/25/40 joint Vacuum 4.4E-3Pa Power supply AC:220V 50/60Hz Gas supply system Model CY-3Z Gas channel 3-channel Measuring unit Gas mass flowmeter Measuring range A channel: 0～100SCCM H2 gas Remarks: If you need   other ranges or gas types, you need to specify when ordering. According to the customer's specific requirements, the flow meter of the corresponding gas type and range can be selected. B channel: 0～300SCCM N2 gas C channel: 0～500SCCM Ar gas measurement accuracy ±1.0%F.S Pipe pressure   resistance 3MPa Working pressure   difference 50～300KPa Connecting pipe 304 stainless steel Gas channel 304 stainless steel needle valve Interface specification 1/4" ferrule connector for gas inlet and outlet Exhaust system Mechanical pump Rotary vane pump Pumping rate 1.1L/S    Exhaust interface KF16 Vacuum measurement Resistance gauge Ultimate vacuum 1.0E-1Pa Power supply AC:220V 50/60Hz Pumping interface KF16

Minimum Order: 1 bags

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam react on the surface of a substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit a variety of materials, including a wide range of insulating materials, Most metal materials and metal alloy materials. CY-O1200-50IT-3F-HV 1200℃ single heating zone high vacuum CVD reactor consists of a single heating zone tube furnace, a three-channel float flow meter and a high vacuum molecular pump set. This reactor is also equipped with a precision molecular pump set, which can achieve a vacuum of 1.0E-3pa level, which can provide users with a purer and more stringent experimental environment than ordinary mechanical pumps. Vacuum tube   furnace Model CY-O1200-50IT Tube material High purity quartz Tube diameter 50mm (Optional 60mm/80mm/100mm) Tube length 800mm Furnace chamber   length 440mm Heating zone   length 400mm Constant   temperature zone 200mm Operating   temperature 0～1100℃ Temperature   control accuracy ±1℃ Temperature   control mode 30 or 50 segment program temperature control Display mode LCD Sealing   method 304 stainless steel vacuum flange Flange   interface 1/4" ferrule connector, KF16/25/40 joint Vacuum 4.4E-3Pa Power supply AC:220V   50/60Hz Gas supply system Model CY-3F Gas channel 3-channel Measuring   unit Gas float flowmeter Measuring range A channel: 0～100ml/min  H2 gas Remarks: If   you need other ranges or gas types, you need to specify when ordering.   According to the customer's specific requirements, the flow meter of the corresponding gas type and range can be selected. B channel: 16～160 ml/min  N2 gas C channel: 25～250 ml/min  Ar gas Measurement   accuracy ±2.0% Pipe   pressure resistance 3MPa Working   pressure difference 50～300KPa Connecting   pipe 304 stainless steel Control   valve 304 stainless steel needle valve Interface   specification 1/4" ferrule connector for gas inlet and outlet Exhaust   system Model CY-GZK103-A Molecular   pump CY-600 Backing pump Rotary vane pump Pumping rate Molecular pump: 600L/S Comprehensive gas pumping performance: the vacuum can reach 1.0E-3Pa in 30 minutes. Rotary vane pump: 1.1L/S Pumping   interface KF40 Exhaust   interface KF16 Vacuum   measurement Compound vacuum gauge: Resistance gauge + ionization gauge Ultimate   vacuum 1.0E-5Pa Power supply AC:220V   50/60Hz

Minimum Order: 1 bags

Chemical vapor deposition (CVD) refers to a method in which chemical gases or steam react on the surface of a substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to deposit a variety of materials, including a wide range of insulating materials, Most metal materials and metal alloy materials CY-O1200-50IT-3F-LV CVD machine consists of a single heating zone tube furnace, a three-channel float flow meter and a double stage rotary vane vacuum pump.It is suitable for high-temperature sintering, metal annealing, quality inspection, etc. in universities, research institutes, industrial and mining enterprises, especially for CVD experiments that require a variety of gas mixing atmospheres. Vacuum tube furnace Model CY-O1200-50IT Tube material High purity quartz Tube diameter 50mm (optional 60mm/80mm/100mm) Tube length 800mm Furnace chamber length 440mm Heating zone length 400mm Constant temperature zone 200mm Operating temperature 0～1100℃ Temperature control accuracy ±1℃ Temperature control mode 30 or 50 segment program temperature control Display mode LCD Sealing method 304 stainless steel vacuum flange Flange interface 1/4" cutting sleeve joint, KF16/25/40 joint Vacuum 4.4E-3Pa Power supply AC:220V 50/60Hz Gas supply system Model CY-3F Gas channel 3-channel Measuring unit Gas float flowmeter Measuring range A channel: 0～100ml H2 gas Remarks: If you need other ranges or gas types, you   need to specify when ordering. According to the customer's specific   requirements, the flow meter of the corresponding gas type and range can be   selected. B channel: 16～160ml N2 gas C channel: 25～250ml Ar gas measurement accuracy ±2.0% Pipe pressure resistance 3MPa Working pressure difference 50～300KPa Connecting pipe 304 stainless steel Gas channel 304 stainless steel needle valve Interface specification 1/4" ferrule connector for gas inlet and outlet Exhaust system Mechanical pump Rotary vane pump Pumping rate 1.1L/S Exhaust interface KF16 Vacuum measurement Resistance gauge Ultimate vacuum 1.0E-1Pa Power supply AC:220V 50/60Hz Pumping interface KF16

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in the fields of photoresist spin coating, biological medium production, and sol-gel method to produce polymer films. After being miniaturized, this model of spin coater adopts aluminum alloy structure, and PP chamber with transparent glass cover of glue hole, which is beautiful and firm. The instrument adopts advanced precision motor, and the rotation speed can reach 10,000 rpm, which effectively guarantees the uniformity of the film formation. In addition, the instrument is controlled by a touch screen, which can preset a uniform curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase.

Minimum Order: 1 bags

After being miniaturized, this model of spin coater adopts stainless steel structure, and PP chamber with transparent glass cover, which is beautiful and firm. The instrument adopts advanced precision motor, and the rotation speed can reach 10,000 rpm, which effectively guarantees the uniformity of the film formation. In addition, the instrument is controlled by a touch screen, which can preset a uniform curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase. Application Scope The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in the fields of photoresist spin coating, biological medium production, and sol-gel method to produce polymer films.

Minimum Order: 1 bags

Anti-corrosion spin coater with heating cover CY-SPC8-HAR 1.This spin coater adopts PTFE chamber, which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents. 2.The device adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3.In addition to the basic spin coating function, this product is also equipped with heating elements, which can be heated up to 200℃, temperature controlled by an intelligent temperature control meter, accurate temperature measurement, and completely controlled temperature rise process. 4.In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 5.It is very suitable for laboratory purchase. Application: The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Minimum Order: 1 bags

Anti-corrosion spin coater CY-SPC8-AR 1.Anti-corrosion spin coater adopts PTFE chamber, which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents. 2.Anti-corrosion spin coater adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3.In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 4.It is very suitable for laboratory purchase. Anti-corrosion spin coater application: The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. 1.This spin coater adopts all-aluminum alloy chamber, which is beautiful and sturdy in appearance. 2. The device adopts advanced precision motor, the maximum speed can reach 10,000rpm, which effectively guarantees the uniformity of film formation. 3. In addition to the basic spin coating function, this product is also equipped with heating elements, which can be heated up to 200℃, temperature controlled by an intelligent temperature control meter, accurate temperature measurement, and completely controlled temperature rise process. 4. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost. 5. It is very suitable for laboratory purchase.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~10000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 8 inches (200mm) Chamber material Aluminum alloy Operation method 7 inches HD LCD touch screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw interface Overall size 290mm×365mm×260mm Total Weight 10kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

Features 1.100 grade purifying effect, can remove the dust to avoid coating sample from pollution 2.Equipped with LED lighting with programmable control, easy operate 3.Time-coating programmable control 4.LCD 7” touch panel, simple and easy operate. Technical parameter Model No. CY-GKF411 Coating time 1-99S Time accuracy ±5%  Coating speed 0-8000RPM Speed accuracy ±3%  Working station Two station Purifying Effect 100 grade(USA Federal Standard) Operating area wind speed 0.3-0.5m/s Wafer dimension 10mm-100mm wafer or other material System control PID Programmable control Outer dimension 800x680x1700mm 

Minimum Order: 1 bags

CY-SPC-HUA6 is a small and flexible spin coater, which can spray the glue on the substrate through the ultrasonic nozzle, and then evenly apply the glue on the substrate through high-speed rotation. It is also possible to directly perform the spin coating operation alone. Features 1.The chamber is equipped with heating elements, which can be baked after spinning coating 2.The product has a gas path controlled by a 2-way float flowmeter, which can pass inert gas into the chamber to protect the glue liquid from the gas in the air when spinning coating 3.This machine is suitable for surface coating of semiconductor wafer, slide, wafer, substrate, ITO conductive glass and other processes and plate making. 4.The maximum size of the crystallizable wafer is 6 inches, the rotational speed can reach 10000rpm, and the acceleration can reach 5000rpm; 5.It has the advantages of stable speed, quick start, convenient operation, etc., and can ensure the consistency and uniformity of the thickness of spinning coating.

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material Plexiglass Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material Plexiglass Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc. Technical parameters: Supply voltage AC220V, 50Hz Spin speed 0~8000rpm Acceleration 100~5000rpm/s Speed resolution 1rpm Single step time 3000s Substrate size Diameter ≤ 4 inches (100mm) Chamber material PTFE Operation method Button + LCD screen Dispensing method Manual dispensing, optional precision syringe pump Coating curve 5 segments per curve, a total of 5 curves can be stored Pumping port Φ8mm quick screw joint Overall size 210mm×250mm×180mm Total Weight 8kg Vacuum pump Dry mechanical pump Pumping rate 1.1L/s Power supply AC220V 50/60Hz

Minimum Order: 1 bags