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Single heating zone rotary plasma CVD reactor with vacuum automatic feeder Single heating zone rotary PECVD, equipped with vacuum automatic feeder, and KF40 interface reserved at the end of the furnace tube can be connected to the receiving tank. The feeder adopts screw feeding, the powder can be fed into the furnace tube at a rated rate, and the feeding rate can be changed by adjusting the rotary speed. It can realize the continuous coating and modification of powder materials by PECVD method under the atmosphere protection environment. The receiving tank can collect the processed powder under the atmosphere protection environment. The equipment is equipped with 100W RF power at 13.56MHz. It can generate plasma in vacuum. High-energy plasma can activate the sample surface, effectively enhance the reaction effect and increase the reaction rate. This auxiliary method is widely used in scientific experiments such as graphene preparation and particle coating. This equipment is especially suitable for granular sample experiments. Through mechanical transmission, it can control the continuous rotation of the working tube 360° with adjustable rotation speed, so that the materials in the tube are continuously stirred and mixed, and fully contact with the gas and plasma, so that the reaction of the sample is more uniform and stable. Technical parameters： 1. RF power supply Output Power 150W Output accuracy ±1% RF frequency 13.56MHz RF stability ±0.005% Cooling method Air-cooling 2. 1200℃ Single heating zone tube furnace Supply voltage AC220V，50Hz Maximum power 2KW Heating zone Single heating zone 200mm Working temperature Maximum 1200 ℃, continuous operating temperature should be ≤1100 ℃ Temperature accuracy ± 1 ℃ Temperature control method AI-PID 30-stage process curve, can store multiple 3. Three temperature zone independent control, with overheat and thermocouple failure protection Furnace tube material High purity quartz Furnace tube size Dia. 50x800mm Sealing method Vacuum stainless steel flange, KF16 flange Adjustable speed 0-20rpm Tilt Angle 0-15° Vacuum pump Rotary vane mechanical pump Ultimate vacuum 1.0E-1Pa Feeding method Vacuum funnel and screw feed

Minimum Order: 1 bags

This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and tilting mechanism, a single heating zone tube furnace, a plasma generator, a mass flow meter gas delivery system, and a high vacuum molecular pump unit. Compared with other graphene preparation equipment, this equipment can provide a higher background vacuum, which can improve the quality of the product; it can use the rotation and tilt mechanism to achieve continuous production, and can make the surface of the particle sample grow products evenly; the plasma generator can significantly reduce the reaction temperature and improve the reaction efficiency. Technical parameters: 1. Single heating zone tube furnace Product model CY-O1200-100IT Furnace tube material High purity quartz Tube diameter 100mm Furnace tube length 1500mm Furnace chamber length 440mm Heating zone length 400mm Constant temperature zone head 200mm Operating temperature 0～1100℃ Temperature control accuracy ±1℃ Temperature control mode 30 or 50 segment program temperature control Display mode HD full color LCD touch screen Sealing method 304 stainless steel vacuum flange Power supply AC: 220V 50/60Hz 2.RF output system Power range 0~500W adjustable working frequency 13.56MHz+0.005% Working mode Continuous output Matched impedance mode It can be matched, and the glow is evenly distributed throughout the furnace tube Power stability ≤2W Normal working reflected power ≤3W Amplified reflected power ≤70W Harmonic component ≤-50dBc Overall efficiency ≥70% Power Factor ≥90% Supply voltage/frequency Single-phase AC (187V~153V) frequency 50/60Hz Control mode Internal control/PLC analog quantity/RS232/485 communication Power protection settings DC over current protection, power amplifier over temperature protection, reflected power protection Cooling method Forced air cooling Glow zone Under Ar, the radio frequency power supply and the coil cooperate with the glow to fill the furnace tube 3. Gas delivery system Flowmeter Four-channel mass flowmeter Flow range MFC1 range: 0~200sccm MFC2 range: 0~200sccm MFC3 range: 0~500sccm MFC4 range: 0~500sccm Corresponding to gases H2, CH4, N2, Ar. Measurement accuracy ±1.5%F.S Repeatability ±0.2%FS Linear accuracy ±1%F.S. Response time ≤4s Work pressure -0.15Mpa~0.15Mpa Flow control LCD touch screen control, digital display, each channel gas contains needle valve for individually control. Intake Interface It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe Outlet Interface It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe Connection method Double ferrule connector Operating temperature 5~45℃ Gas premix Equipped with gas premixing device 4.Exhaust system Product model CY-GZK103-A Molecular pump Turbomolecular pump Backing pump Two-stage rotary vane pump Pumping rate Molecular pump: 600L/S Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa Rotary vane pump: 1.1L/S Ultimate vacuum 5×10E-4Pa Pumping port KF40 Exhaust interface KF16 Vacuum measurement Compound vacuum gauge 5.Rotating and tilting device Speed range 0-20rpm Tilt angle 0-15° Material feeding and receiving system Automatic feeding, automatic collection after tilting

Minimum Order: 1 bags

PECVD with roll to roll systemis a plasma enhanced chemical vapor deposition device (PECVD) equipped with a roll-to-roll movement system. It is not only used in the continuous heat treatment process of wire rod, such as the preparation of carbon fiber, the modification of alloy and other materials wire rod, but also used for the continuous growth of graphene on the coil. The equipment is composed of five parts: a roll-to-roll movement system, 1200℃2- heating-zone open tube furnace, PE plasma enhancement system, vacuum system and three-way proton flowmeter gas supply system. The whole system can work in the vacuum / atmosphere protection environment. The speed of the winding device can be adjusted from 1 to 400mm / min, and the mechanism adopts feedback adjustment, which can automatically correct the speed deviation and ensure the speed stability of the sample, thus ensuring the accuracy of the experiment..  Technical parameter: 1. 1200℃2-heating-zone open tube furnace Voltage AC220V,50Hz Max power 3KW Heating zone Dual zones 200mm+200mm Working temperature ≤1200℃ Temperature control accuracy ±1℃ Temperature control method AI-PID 30-stage process curve, can store multiple Tube material High purity quartz Tube size φ80mm I.D x 1400mm L Sealing mode Stainless steel vacuum flange Vacuum measurement Resistance gauge Working gas Non-corrosive gases such as hydrogen, nitrogen, argon, and oxygen Vacuum pump Bipolar rotary vane vacuum pump Ultimate vacuum 10^-1Pa 2.Three-way mass flowmeter Valve type Stainless steel needle valve Gas channels Three-way Pressure range 0.05~0.3MPa Range 0~100 SCCM (Ar);0~200 SCCM(H2);0~500 SCCM(CH4) Flow control range ±1.5% Mixing tank volume 750mL Gas path material 304 stainless steel Pipe interface 6.35mm Bite type joint Power supply AC220V 50Hz 3.RF power Output Power 500W Output accuracy ±1% RF frequency 13.56MHz RF stability ±0.005% Cooling method Water cooling

Minimum Order: 1 bags

1200C PE-HPCVD Two Zone Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump (import molecular pump, without oil)+INFICON vacuumeter CY-OTF-1200X-II-PEC4 is a 1200ºC Two-Zone Plasma-Enhanced Hybrid-Physical- Chemical Vapor Deposition (PE-HPCVD) system. It consists of a Tiltable Frame, 300W RF Plasma Generator & Matching Network, Up-Stream Source Evaporation Boat with Power Supply, Four-Channel MFC Gas Delivery, and High-Performance Vacuum Pump. Such a complete system is an excellent tool for heat-treating inorganic compound powders with superior temperature and surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on the surface). System Structure Integrated 300W (13.56Mhz) RF power supply with matching network enables the plasma-enhanced processing which significantly reduces the needs for high- temperature process Quartz tube allows processing for powders Four-channel gas mixing station with MFCs provide precise control of gas delivery The integration of Up-Stream Source Evaporation Boat with tungsten coil allows you sublimate solid precursors for the needs of Hybrid Physical-Chemical processing

Minimum Order: 1 bags

1200C PE-HPCVD Two Zone Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump (import molecular pump, without oil)+INFICON vacuumeter CY-OTF-1200X-II-PEC4 is a 1200ºC Two-Zone Plasma-Enhanced Hybrid-Physical- Chemical Vapor Deposition (PE-HPCVD) system. It consists of a Tiltable Frame, 300W RF Plasma Generator & Matching Network, Up-Stream Source Evaporation Boat with Power Supply, Four-Channel MFC Gas Delivery, and High-Performance Vacuum Pump. Such a complete system is an excellent tool for heat-treating inorganic compound powders with superior temperature and surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on the surface). System Structure Integrated 300W (13.56Mhz) RF power supply with matching network enables the plasma-enhanced processing which significantly reduces the needs for high- temperature process Quartz tube allows processing for powders Four-channel gas mixing station with MFCs provide precise control of gas delivery The integration of Up-Stream Source Evaporation Boat with tungsten coil allows you sublimate solid precursors for the needs of Hybrid Physical-Chemical processing

Minimum Order: 1 bags

MPCVD single crystal diamond deposition equipment Application Preparation of high-quality single crystal diamond; Preparation of high-quality polycrystalline free-standing diamond films; Preparation of high quality polycrystalline diamond films; Preparation of various carbon nano films such as graphene, carbon nanotubes, fullerenes and diamond films. Features a.Stainless steel cavity type 6kw microwave plasma equipment, high power density; b.The water-cooled substrate stage and the water-cooled metal chamber ensure the system can work stably for a long time; c.The substrate temperature is achieved by microwave plasma self-heating; d.The vacuum measuring instrument adopts a full-range vacuum gauge, which can accurately measure the background vacuum and working gas pressure; e.The vacuum pump and valve adopt turbo molecular pump (the ultimate vacuum is 1×10-5Pa) and the rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa), and the system can automatically control the deposition pressure; f.Cooling water circulation system to ensure long-term safe and stable operation of the device under high power; g.15-inch touch screen, PLC automatic control, can set the temperature or pressure to be constant, can save and reuse up to 20 sets of process files; Fully automatic process control module, which can stably and reliably prepare high- quality diamond films and crystals

Minimum Order: 1 bags

This equipment is customized plasma testing equipment for customers. The main component of the equipment is an inductively coupled plasma generator. The generator can generate plasma in the quartz tube inside the inductance coil. The flanges on both sides of the quartz tube are equipped with observation windows. Users can observe experimental phenomena on the observation window or use other The instrument measures relevant parameters. The device is controlled by a touch screen, and the screen integrates all experimental functions, such as vacuum extraction, flow control, and RF power adjustment. At the same time, the inductance coil adopts water cooling design, and the outer casing has a cooling fan to ensure the stability of the whole equipment for a long time. This equipment is an indispensable instrument for the research of plasma-related properties in college laboratories. Technical parameter Supply voltage:AC220V，50Hz Maximum power: 1KW Coupling method: Inductive coupling Quartz cavity: O.Dφ30mm X 150mm wall thickness 3.5mm Observation window size: φ30mm Vacuum interface: KF16 Air inlet interface: 6.35mm ferrule connector Mass flowmeter: Ar calibration range 100sccm Vacuum pump: Bipolar rotary vane vacuum pump Ultimate vacuum: 0.1Pa cooling method: Water-cooled copper tube + air-cooled shell RF power supply: Maximum output power 300W Automatic matching Overall size: 560mm X 620mm X 620mm

Minimum Order: 1 bags

Introduction CY-SPC12-BXG spin coater is with vacuum chuck designed for easy and quick coating via sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision motor, the maximum speed can reach 5000rpm, which effectively guarantees the uniformity of film formation. Besides, the instrument adopts touch screen control, can preset the coating curve, which greatly simplifies the process. Application Liquid or colloidal materials can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, mainly used in photoresist spin coating, biological medium production, sol-gel method for polymer film production, etc. Technical parameters 1. Input power supply AC220V, 50Hz 2. Chamber material stainless steel 3. Substrate size Diameter≤12 inches (~300mm) 4. Spin speed 0-5000rpm 5. Acceleration 100-5000rpm/s 6. Speed resolution 1rpm 7. Single step time 3000s 8. Operation method 7 inches HD LCD touch screen 9. Dispensing method Manual dispensing 10. Coating curve Each curve has 5 segments, can store 5 curves in total 11. Vacuum chuck Yes, includes 12. Vacuum pump Oil-less pump 13. Pumping speed 50 L/min 14. Total weight ~40kg

Minimum Order: 1 bags

Intro The CY-SPC12-HP large-scale spin coater adopts a high-power servo motor and a high- precision driver to realize accurate spinning coating experiments on large-size samples. It can support samples up to 300mm in diameter and 2.3mm in thickness. And the speed resolution of the adopted high-precision drive can reach 0.2 rpm. The chamber is made of stainless steel, which is beautiful and easy to clean, and has a locking device. After loading the sample, the chamber can be locked to prevent the sample from flying out in the event of an accident, which can effectively protect the user. In addition, the chamber has a built-in glue outlet for easy collection of waste liquid. Technical parameter Model CY-SPC12-HP Chamber Stainless steel; Support a diameter of 300mm and a thickness of 2.3mm; Built-in glue outlet Spinning speed ≤3000rpm Speed resolution 0.2rpm Control mode 15 inch full HD touch screen with USB port upgrade program Power supply AC220V 50Hz 2kW Vacuum pump oilless vacuum pump，pumping120L/min Vacuum interface KF16

Minimum Order: 1 bags

CY-SP8-UV spin coater uses the centrifugal force generated by high-speed rotation to coat the film material. This model is equipped with an ultraviolet light source, which can realize the drying function of special film materials. This machine adopts precision DC brushless motor, which has fast starting speed and stable speed, which ensures the consistency and uniformity of coating thickness. The sample is fixed by vacuum adsorption, which is easy to operate and can be taken and placed freely. Suction cups of various sizes can be selected according to the sample size.Also it is simple and convenient to replace the vacuum chuck. Technical parameter 1. Maximum speed 10000 RPM 2. Speed resolution 1 RPM 3. Maximum rotation time 3000 S 4. Rotation time resolution 1 S 5. Maximum acceleration 8000RPM/S 6. UV wavelength 365nm 7. Sample size ≤8inches 8. Size 290mm(W)x360mm(D)x370mm(H) 9. Weight 20kg 10. Power input AC200-230V，600W 11. Vacuum input requirements 0.06-0.09Mpa, vacuum flow minimum 15L/min or more 12. Vacuum interface φ8mm quick screw interface 13. Working gas Non-corrosive gases such as nitrogen, argon, oxygen, etc.

Minimum Order: 1 bags

Introduction CY-SPC12-C spin coater is with vacuum chuck designed for easy and quick coating via sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision motor, the maximum speed can reach 5000rpm, which effectively guarantees the uniformity of film formation. Besides, the instrument adopts touch screen control, can preset the coating curve, which greatly simplifies the process. Application Liquid or colloidal materials can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, mainly used in photoresist spin coating, biological medium production, sol-gel method for polymer film production, etc. Technical parameters 1. Input power supply AC220V, 50Hz 2. Chamber material PP (transparent acrylic) 3. Substrate size Diameter≤12 inches (~300mm) 4. Spin speed 0-5000rpm 5. Acceleration 100-5000rpm/s 6. Speed resolution 1rpm 7. Single step time 3000s 8. Operation method 7 inches HD LCD touch screen 9. Dispensing method Manual dispensing 10. Coating curve Each curve has 5 segments, can store 5 curves in total 11. Vacuum chuck Yes, includes 12. Vacuum pump Oil-less pump 13. Pumping speed 50 L/min 14. Total weight ~40kg

Minimum Order: 1 bags

4-inch anti-corrosion heating spin coater This product is a spin coater or spin processor, which uses centrifugal force generated by high-speed rotation to coat film materials. This model adopts a special design, so that the substrate can be heated simultaneously during the spin coating process. The maximum heating temperature is 200℃, which can meet the temperature requirements of some solutions in the spin coating process. At the same time, the equipment is also equipped with a liquid drain pipe and a waste tank to facilitate customers to collect waste liquid and effectively prevent corrosive liquid from splashing into the environment. Technical parameters: Power supply AC220V, 50Hz Chamber material PTFE Upper cover PVC (Polyvinyl chloride, for observing the coating state conveniently) Sample stage Gold-plated copper plate, with good thermal conductivity Substrate size Diameter ≤ 4 inches (100mm) Heating mode Ceramic heating ring Operating temperature RT-200℃ Rotation speed 0-3000rpm Speed resolution 1rpm Operation Mode 7 inch HD LCD touch screen Glue dropping mode Manual glue dispensing, liquid can be supplied during spin coating Liquid drain pipe and waste liquid tank PTFE Spin coating curve Each curve has 5 segments, a total of 5 curves can be stored Vacuum chuck Gold-plated, 3 pieces with diameters of 10mm, 25mm, 55mm vacuum pump Oil-less pump Pumping speed 50 L/min

Minimum Order: 1 bags

4-inch anti-corrosion heating spin coater This product is a spin coater or spin processor, which uses centrifugal force generated by high-speed rotation to coat film materials. This model adopts a special design, so that the substrate can be heated simultaneously during the spin coating process. The maximum heating temperature is 200℃, which can meet the temperature requirements of some solutions in the spin coating process. At the same time, the equipment is also equipped with a liquid drain pipe and a waste tank to facilitate customers to collect waste liquid and effectively prevent corrosive liquid from splashing into the environment. Technical parameters: Power supply AC220V, 50Hz Chamber material PTFE Upper cover PVC (Polyvinyl chloride, for observing the coating state conveniently) Sample stage Gold-plated copper plate, with good thermal conductivity Substrate size Diameter ≤ 4 inches (100mm) Heating mode Ceramic heating ring Operating temperature RT-200℃ Rotation speed 0-3000rpm Speed resolution 1rpm Operation Mode 7 inch HD LCD touch screen Glue dropping mode Manual glue dispensing, liquid can be supplied during spin coating Liquid drain pipe and waste liquid tank PTFE Spin coating curve Each curve has 5 segments, a total of 5 curves can be stored Vacuum chuck Gold-plated, 3 pieces with diameters of 10mm, 25mm, 55mm vacuum pump Oil-less pump Pumping speed 50 L/min

Minimum Order: 1 bags

PTL-OV6P (Update from WPTL6-0.01) is a CE Certified Programmable Dip Coater (1-40 mm/min) designed to preparing multilayer coating up to 6 solutions inside a temperature controlled oven with touch-screen digital control. Dipping rate, pulling rate, dwell time, and amount of cycles can be setup by touch screen controller. It is designed for R&D Lab to prepare various optical or epitaxial films from liquid solution. 1. Controller 6" LCD color touch screen controller Working Voltage: 110-240V AC Max. Power Consumption: 50W 2. Liquid Holder Disk Can carry up to 6 liquid solutions Manually Rotate  Up to 6 layers of coating can be achieved by rotating liquid holder disk to dip samples from one solution to another 3. Beaker Six 150 ml beakers are included for immediate use Dimensions: 58mm(Dia) x 85mm(H) 4. Traveling Distance 0-80 mm Adjustable 5. Dipping/Pulling Speed 1-40 mm/min Programmable with accuracy within +/- 0.02% 6. Temperature Range 50-200°C (+/-1°C accuracy) 6. Dwell Time (in liquid) 0-999 seconds 7. Dry Time 0-999 seconds 8. Amount of Dipping 1-10 times at each position 9. Max. Amount of Cycles 50 times 10. Sample Holder Up to 6 samples can be carried sliding up and down through two guide rods 11. Oven Working Voltage: 208-240V AC (110V version is available via transformer) Max. Power Consumption: 600W Temperature:   50-200°C controlled by digital controller with +/- 1°C accuracy. Chamber Dimensions: 280mm(L) x 280mm(W) x 280mm(H) Inner Material: Stainless Steel Outside Dimensions: 406mm(L) x 406mm(W) x 610mm(H) 12. Product Dimensions  500mm(L) x 500mm(W) x 1180mm(H) 13. Compliance CE Certified 14. Warranty One year limited with lifetime support

Minimum Order: 1 bags